Effect of Low Temperature Gas Nitriding and Low Temperature Gas Carburizing on High Cycle Fatigue Property in SUS316L

نویسندگان
چکیده

برای دانلود باید عضویت طلایی داشته باشید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

Low-temperature gas from marine shales

Thermal cracking of kerogens and bitumens is widely accepted as the major source of natural gas (thermal gas). Decomposition is believed to occur at high temperatures, between 100 and 200 degrees C in the subsurface and generally above 300 degrees C in the laboratory. Although there are examples of gas deposits possibly generated at lower temperatures, and reports of gas generation over long pe...

متن کامل

Optimization of Integrated Low-Temperature Gas Separation Processes Using SA Method and Different Refrigerants

In low-temperature processes, heat rejected from separation columns is removed by refrigeration systems to heat sinks (reboilers & pre-heaters), process streams, other <span style="font-size: 10pt; col...

متن کامل

Effects of Gas Nitriding Temperature on the Surface Properties of a High Manganese TWIP Steel

The effects of gas nitriding temperature on the cross section morphology, element nitrogen distribution, and surface layer compositions of a cold rolled and pre-strained high manganese austenitic TWIP steel 25Mn-3Cr-3Al-0.3C-0.01N and the corresponding anti-corrosion ability have been studied. The results show that, depending on nitriding temperature, the distribution of element nitrogen and ma...

متن کامل

On the Low-Temperature Response of Semiconductor Gas Sensors

The present paper compares three different kinds of semiconductor gas sensing materials: metal oxides (MOX), hydrogenterminated diamond (HD), and hydrogenated amorphous silicon (a-Si:H). Whereas in MOX materials oxygen is the chemically reactive surface species, HD and a-Si:H are covalently bonded semiconductors with hydrogenterminated surfaces. We demonstrate that these dissimilar semiconducto...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

ژورنال

عنوان ژورنال: Journal of the Society of Materials Science, Japan

سال: 2008

ISSN: 1880-7488,0514-5163

DOI: 10.2472/jsms.57.563